Wise, B. M., Gallagher, N. B., & Martin, E. B. (2001).
Application of PARAFAC2 to fault detection and diagnosis in semiconductor etch.
Journal of Chemometrics, 15, 285-298.
Monitoring and fault detection of batch chemical processes are complicated by stretching of the time axis,
resulting in batches of different length. This paper offers an approach to the unequal time axis problem using the
parallel factor analysis 2 (PARAFAC2) model. Unlike PARAFAC, the PARAFAC2 model does not assume
parallel proportional profiles, but only that the matrix of profiles preserves its ‘inner product structure’ from
sample to sample. PARAFAC2 also allows each matrix in the multiway array to have a different number of rows.
It has previously been demonstrated how the PARAFAC2 model can be used to model chromatographic data
with retention time shifts. Fault detection and, to a lesser extent, diagnosis in a semiconductor etch process are
considered in this paper. It is demonstrated that PARAFAC2 can effectively model batch process data from
semiconductor manufacture with unequal dimension in one of the orders, such as the unequal batch length
problem. It is shown that the PARAFAC2 model has approximately the same sensitivity to faults as other
competing methods, including principal component analysis (PCA), unfold PCA (often referred to as multiway
PCA), trilinear decomposition (TLD) and conventional PARAFAC. The advantage of PARAFAC2 is that it is
easier to apply than MPCA, TLD and PARAFAC, because unequal batch lengths can be handled directly rather
than through preprocessing methods. It also provides additional diagnostic information: the recovered batch
profiles. It is likely, however, that it is less sensitive to faults than conventional PARAFAC.
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